Design and implementation of a micron-sized electron column fabricated by focused ion beam milling

被引:2
作者
Wicki, Flavio [1 ]
Longchamp, Jean-Nicolas [1 ]
Escher, Conrad [1 ]
Fink, Hans-Werner [1 ]
机构
[1] Univ Zurich, Dept Phys, CH-8057 Zurich, Switzerland
基金
瑞士国家科学基金会;
关键词
Electron optics; Low-energy electrons; Imaging; Coherent diffraction; Electron lens; ABERRATION CORRECTION; POINT-SOURCE; MICROSCOPY; LENSES;
D O I
10.1016/j.ultramic.2015.09.013
中图分类号
TH742 [显微镜];
学科分类号
摘要
We have designed, fabricated and tested a micron-sized electron column with an overall length of about 700 microns comprising two electron lenses; a micro-lens with a minimal bore of 1 micron followed by a second lens with a bore of up to 50 microns in diameter to shape a coherent low-energy electron wave front. The design criteria follow the notion of scaling down source size, lens-dimensions and kinetic electron energy for minimizing spherical aberrations to ensure a parallel coherent electron wave front. All lens apertures have been milled employing a focused ion beam and could thus be precisely aligned within a tolerance of about 300 nm from the optical axis. Experimentally, the final column shapes a quasi-planar wave front with a minimal full divergence angle of 4 mrad and electron energies as low as 100 eV. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:74 / 79
页数:6
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