Effect of the Radial Ionization Profile of Proton on SEU Sensitivity of Nanoscale SRAMs

被引:21
作者
Hubert, G. [1 ]
Li Cavoli, P. [1 ]
Federico, C. [2 ]
Artola, L. [1 ]
Busto, J. [3 ]
机构
[1] French Aerosp Lab ONERA, F-31055 Toulouse, France
[2] IEAv, Sao Jose Dos Campos, Brazil
[3] Particle Phys Lab Marseilles CPPM, F-13288 Marseille, France
关键词
Bulk; FDSOI; MUSCA SEP3; proton; radial ionization profile; single event effect modeling; single event upset (SEU); SINGLE-EVENT-UPSETS; ENERGY ELECTROMAGNETIC MODELS; GEANT4 PHYSICS PROCESSES; NM NODE; MICRODOSIMETRY; DEPOSITION; IMPACT; BEAMS; BULK; IONS;
D O I
10.1109/TNS.2015.2496238
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper investigates the impact of the radial ionization profile of proton on SEU sensitivity for nanoscale devices. Intrinsic radial track structures of energy deposition of protons (from 0.5 to 2 MeV) in a silicon box with mu m of Si over-layer and a 100-nm silicon film were investigated. The orders of magnitude of the radial deposition is around 200 to 300 nm. Approaches based on punctual or average depositions induce a drift increasing for nanoscale volumes. Realistic energy deposition databases were developed thanks to GEANT4 and coupled with MUSCA SEP3 to perform SEU cross sections and SER estimations. Calculations applied to SOI and bulk technologies (65 and 45-nm) were conducted and compared with experimental results. Calculations are consistent with experiments, despite some drifts. Analyses demonstrate the necessity to consider the 3D morphology description in SEE modeling for nanoscale technologies, more particularly for SOI technologies.
引用
收藏
页码:2837 / 2845
页数:9
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