Worst-case Delay Analysis Considering the Variability of Transistors and Interconnects

被引:0
|
作者
Fukuoka, Takayuki [1 ]
Tsuchiya, Akira [1 ]
Onodera, Hidetoshi [1 ]
机构
[1] Kyoto Univ, Dept Commun & Comp Engn, Kyoto 6068501, Japan
关键词
worst-case delay; process variation; interconnect;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper discusses the condition that gives the statistical worst-case delay of a stage under the fluctuation of interconnect structure and transistor performance. The delay of a stage is a function of many parameters such as drive strength of the gate, interconnect length and interconnect structures (width, thickness, spacing, etc.), and therefore the condition for the worst-case delay also becomes a function of those parameters. We examine the worst-case condition using a simple equivalent circuit and show how the worst-case condition varies. It is shown that the worst-case condition of an interconnect structure for a certain range of interconnect length moves toward the best-case for other range of interconnect length, and hence it is important to locate the worst-case condition correctly for accurate estimation of the worst-case stage delay. We show a simple criteria for the direction of the worst-case condition of an interconnect structure.
引用
收藏
页码:35 / 41
页数:7
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