Deposition of SiOx films from O2/HMDSO plasmas

被引：95
作者：
Hegemann, D
Vohrer, U
Oehr, C
Riedel, R
机构：
[1] Fraunhofer Inst Grenzflachen & Bioverfahrenstech, D-70563 Stuttgart, Germany
[2] Tech Univ Darmstadt, Fachbereich Mat Wissensch, Fachgebiet Disperse Feststoffe, D-64287 Darmstadt, Germany
来源：
SURFACE & COATINGS TECHNOLOGY | 1999年 / 116卷
关键词：
adhesion; r.f; plasma; SiOx films;
D O I：
10.1016/S0257-8972(99)00092-4
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The variation of O-2/HMDSO ratio in an r.f. plasma was carried out to optimize SiOx film properties and deposition rates for the coating of polymers. A ratio exceeding 6:1 yields scratch resistant, quartz-like films with low carbon contents. The chemical composition was analyzed to SiO1.8C0.3 by XPS. A compact plasma reactor was developed generating homogeneous plasmas and depositions over large areas (up to 380 x 290 mm(2)). Furthermore, the total coverage of three-dimensional formed parts was managed with good adhesion of SiOx films to polymers like PC and PBT to reduce wear. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：1033 / 1036
页数：4
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