Recent progress in antireflection and self-cleaning technology - From surface engineering to functional surfaces

被引:346
作者
Yao, Lin [1 ,2 ,3 ]
He, Junhui [1 ,2 ]
机构
[1] Chinese Acad Sci, Tech Inst Phys & Chem, Funct Nanomat Lab, Beijing 100190, Peoples R China
[2] Chinese Acad Sci, Tech Inst Phys & Chem, Key Lab Photochem Convers & Optoelect Mat, Beijing 100190, Peoples R China
[3] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
关键词
TIO2; THIN-FILMS; MESOPOROUS SILICA NANOPARTICLES; CHEMICAL-VAPOR-DEPOSITION; LIQUID-PHASE DEPOSITION; SUPER-WATER-REPELLENT; ROBUST SUPERHYDROPHOBIC SURFACES; ATOMIC LAYER DEPOSITION; SOL-GEL COATINGS; BROAD-BAND; TITANIUM-DIOXIDE;
D O I
10.1016/j.pmatsci.2013.12.003
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Recently, antireflective coatings (ARCs) with self-cleaning properties have attracted significant attention for both their fundamental aspects and wide practical applications. In the current review, the basic principles of antireflection and self-cleaning are briefly discussed first. Then, fabrication strategies with particular emphasis on silicon and silica substrates are reviewed in detail. Meanwhile, ARCs and self-cleaning coatings on polymer and metal foil are also briefly described. Afterwards, progresses in antireflective self-cleaning coatings and some multifunctional ARCs in the latest five years are presented in detail. The applications of ARCs are discussed in terms of architectural glasses, solar collectors, photovoltaic modules, and display devices. Finally, current challenges faced in practical applications and the trend of future development are presented and discussed to facilitate a universal understanding of ARCs and self-cleaning coatings. (C) 2013 Elsevier Ltd. All rights reserved.
引用
收藏
页码:94 / 143
页数:50
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