Fulvenallene and fulvenallenyl photodissociation dynamics at 248 nm

被引：0
|
作者：
Shapero, Mark [1 ]
Ramphal, Isaac [1 ]
Neumark, Daniel [1 ]
机构：
[1] Univ Calif Berkeley, Chem, Berkeley, CA 94720 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2017年 / 253卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
20
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页数：1
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