Aerosol-assisted chemical vapour deposition of α-Fe2O3 nanoflowers for photoelectrochemical water splitting

3-dimensional (3D) nanostructures have gained broad attention in the field of microelectronics and nanotechnology owing to their fascinating properties and potential for novel applications. To enable successful fabrication of the nanostructure, deep understanding on their growth mechanism is an absolute prerequisite. In this study, thin film of hematite (alpha-Fe2O3) nanoflakes is successfully converted to nanoflowers using aerosol-assisted chemical vapour deposition (AACVD) technique simply by supplying high amount of oxygen and regulating the deposition time. The crystal structure and morphological properties including thickness and roughness of the film are thoroughly investigated to provide a clear explanation on the growth mechanism of alpha-Fe2O3 by AACVD. Results indicate that (110) crystal plane is the predominant factor that influence the formation of nanoflowers with unique pyramidal nanostructure. This structure causes the film thickness to increase linearly while the surface roughness shows a logarithmic growth trend. The samples are further employed in photoelectrochemical (PEC) water splitting as photoanode where 40 min deposition period is the optimum condition for achieving PEC photocurrent density of up to 585 mu A/cm(2) at 1.2 V vs. Ag/AgCl. The major contributor towards the performance enhancement is the large surface area and high light absorption of alpha-Fe2O3 nanoflowers as this parameter provides greater sites for photocatalytic activity, greater charge generation and enhanced charge carrier separation efficiency.