Solution-cathode glow discharge was studied in an attempt to further elucidate the processes involved in the plasma. Spectroscopic and electrical properties were measured with and without the influence of three organic modifiers: formic acid, acetic acid, and ethanol. Degradation products (CO, C-2, and CH) of the modifiers were detected in the plasma spectroscopically. Properties of solutions before and after exposure to the discharge were compared. The effects of organic additives on these solution properties were measured. A single, simple mechanism was not consistent with the data, so a multi-part mechanism is proposed for solution and analyte transport into the plasma. Evaporation from the cathode surface, droplet generation, and chemical generation of volatile species may each play a role.
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Li, Qing
Zhang, Zhen
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Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Zhang, Zhen
Wang, Zheng
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机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Li, Qing
Zhang, Zhen
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Zhang, Zhen
Wang, Zheng
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China