The fabrication of TiNi thin films by pulsed-laser deposition

被引：1

作者：

Chen, XY ^{[1
]}

Lu, YF ^{[1
]}

Ren, ZM ^{[1
]}

Zhu, S ^{[1
]}

机构：

[1] Natl Univ Singapore, Dept Elect Engn, Laser Microproc Lab, Singapore 119260, Singapore

来源：

SECOND INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2002年 / 4426卷

关键词：

shape memory alloy; TiNi; thin film; laser ablation; PLD;

D O I：

10.1117/12.456841

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

TiNi shape memory alloy (SMA) thin films have been fabricated by pulsed-laser deposition (PLD) at different substrate temperatures. The stoichiometry, surface morphology and crystallinity of the films were characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM) and X-ray diffraction (XRD). The transformation behaviour and crystallization temperatures were investigated by differential scanning calorimetry (DSC). It is found that the Ni content of the deposited films ranges from 46.7 to 52.0 at.%. The films deposited at low temperature are amorphous. The crystallization temperature of the Ti-51.5 at.% Ni thin film is 449degreesC. The martensitic transformation temperature of the film is -20.8degreesC.

引用

页码：225 / 228

页数：4

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