Fabrication of anti-reflection coating layers for silicon solar cells by liquid phase deposition

被引：3

作者：

Lu, Yen-Tien ^{[1
]}

Barron, Andrew R. ^{[2
,3
,4
]}

机构：

[1] Rice Univ, Dept Chem & Biomol Engn, Houston, TX 77005 USA

[2] Rice Univ, Dept Chem, Houston, TX 77005 USA

[3] Rice Univ, Dept Mat Sci & Nano Engn, Houston, TX 77005 USA

[4] Univ Coll Swansea, Coll Engn, Res Inst, Energy Safety, Swansea, W Glam, Wales

来源：

MAIN GROUP CHEMISTRY | 2015年 / 14卷 / 04期

关键词：

Silicon; titanium; zirconium; oxide; thin film; liquid phase deposition; THIN-FILMS; AQUEOUS-SOLUTIONS; LOW-TEMPERATURE; OXIDE; MICROSTRUCTURE; TECHNOLOGY;

D O I：

10.3233/MGC-150171

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A range of experimental conditions have been investigated for the growth of composite SiO2/ZrO2 and SiO2/TiO2 thin films by liquid phase deposition (LPD) on Si wafers. The film thickness and refractive index (n) are obtained by ellipsometry, elemental composition was determined by X-ray photoelectron spectroscopy (XPS), and film morphology was detected by scanning electron microscopy (SEM). Excessively long deposition time and high deposition temperature are found to be unfavorable for formation of compact films even though the film growth rate is improved under these conditions.

引用

页码：279 / 290

页数：12

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