Atomistic simulations of elastic and plastic properties in amorphous silicon

被引:22
作者
Talati, M. [1 ,2 ,3 ]
Albaret, T. [1 ,2 ]
Tanguy, A. [1 ,2 ]
机构
[1] Univ Lyon, F-69622 Villeurbanne, France
[2] Univ Lyon 1, PMCN, CNRS, UMR 5586, F-69622 Villeurbanne, France
[3] Forschungszentrum Rossendorf EV, Inst Sicherheitsforsch, D-01314 Dresden, Germany
关键词
ION-IMPLANTED SILICON; MOLECULAR-DYNAMICS;
D O I
10.1209/0295-5075/86/66005
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We present here potential-dependent mechanical properties of amorphous silicon studied through molecular dynamics (MD) at low temperature. On average, the localization of elementary plastic events and the co-ordination defect sites appears to be correlated. For Tersoff potential and SW potential the plastic events centered on defect sites prefer 5-fold defect sites, while for modified Stillinger-Weber potential such plastic events choose 3-fold defect sites. We also analyze the non-affine displacement field in amorphous silicon obtained for different shear regime. The non-affine displacement field localizes when plastic events occur and shows elementary shear band formation at higher shear strains. Copyright (C) EPLA, 2009
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页数:6
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