Thermal diffusivity measurement of a thin metal film with a picosecond thermoreflectance technique

被引：11

作者：

Taketoshi, N ^{[1
]}

Baba, T ^{[1
]}

Ono, A ^{[1
]}

机构：

[1] Natl Res Lab Metrol, Tsukuba, Ibaraki 3058563, Japan

来源：

HIGH TEMPERATURES-HIGH PRESSURES | 2002年 / 34卷 / 01期

关键词：

D O I：

10.1068/htwu125

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

A picosecond thermoreflectance measurement system in the National Research Laboratory of Metrology has been improved by introducing a 'rear heating/front probing' configuration. Both rear heating/front probing and conventional front heating/front probing thermoreflectance signals can be observed for thin films deposited on transparent substrates. The analytical solution of the temperature response is presented. It considers the penetration depth of a heating beam and a probe beam, and is derived based on the response function method. These analyses were applied to an aluminium thin film, nominally 100 nm thick, deposited on a Pyrex 7740 glass substrate. The thermal diffusivity calculated from the front heating/front probing thermoreflectance signal is 30% smaller than that of the bulk aluminium. The thermal diffusivity calculated from the rear heating/front probing thermoreflectance signal is 6.2% smaller than that of the bulk aluminium.

引用

页码：19 / 28

页数：10

共 13 条

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