Ultra-stable oven designed for x-ray reflectometry and ellipsometry studies of liquid surfaces

被引：6

作者：

Brown, M

Uran, S

Law, B

Marschand, L

Lurio, L

Kuzmenko, I

Gog, T

机构：

[1] Kansas State Univ, Dept Phys, Manhattan, KS 66506 USA

[2] No Illinois Univ, Dept Phys, De Kalb, IL 60115 USA

[3] Argonne Natl Lab, Adv Photon Source, CMC CAT, Argonne, IL 60439 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2004年 / 75卷 / 08期

关键词：

D O I：

10.1063/1.1771496

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Stable temperature control is highly desirable for reflectivity studies of binary liquid mixtures. In this article we report on the construction of an oven that possesses good temperature stability (similar to1 mK/day) and small transverse temperature gradients (<1 mK/cm). The oven has a horizontal geometry and can be used for either x-ray reflectometry or ellipsometry measurements from the liquid/vapor surfaces of such systems. Details of the oven design together with test results are provided. (C) 2004 American Institute of Physics.

引用

页码：2536 / 2540

页数：5

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