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The growth of an ordered Mn layer on the Si(111)-1 x 1-Ho surface
被引:2
|作者:
Reakes, Michael B.
[1
]
Eames, Chris
[1
]
Tear, Steve P.
[1
]
机构:
[1] Univ York, Dept Phys, York YO10 5DD, N Yorkshire, England
基金:
英国工程与自然科学研究理事会;
关键词:
ELECTRONIC-STRUCTURE;
MANGANESE SILICIDE;
EPITAXIAL-GROWTH;
SCHOTTKY-BARRIER;
ROOM-TEMPERATURE;
FILMS;
CLUSTERS;
SI;
D O I:
10.1088/0953-8984/21/26/265001
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
The growth of ordered Mn layers on room temperature and liquid nitrogen cooled Si(111)-1 x 1-Ho surfaces has been studied using scanning tunnelling microscopy. We have shown for 4 ML (monolayers) of Mn grown on a cooled Si(111)-1 x 1-Ho surface that an ordered Mn layer is produced without any, or with only limited, silicide formation. This surface exhibits a (root 3 x root 3)R30 degrees low energy electron diffraction pattern. Significant variations in Mn island sizes have also been seen on the Si(111)-1 x 1-Ho and Si(111)-7 x 7 surfaces for Mn deposited at room temperature and at-180 degrees C.
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页数:7
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