Studies on the effect of substrate temperature on (VI-VI) textured tungsten oxide (WO3) thin films on glass, SnO2:F substrates by PVD:EBE technique for electrochromic devices

被引：46
作者：
Sivakumar, R
Jayachandran, M
Sanjeeviraja, C [1 ]
机构：
[1] Alagappa Univ, Dept Phys, Karaikkudi 630003, Tamil Nadu, India
[2] Cent Electrochem Res Inst, ECMS Div, Karaikkudi 630006, Tamil Nadu, India
来源：
MATERIALS CHEMISTRY AND PHYSICS | 2004年 / 87卷 / 2-3期
关键词：
thin films; evaporation; electron microscopy (SEM); optical properties;
D O I：
10.1016/j.matchemphys.2004.06.028
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Electrochromic VI-VI compound semiconductor tungsten oxide (WO3) thin films have pronounced feature in electrochromic devices. These films have been prepared by employing one of the physical vapour deposition methods (PVD), i.e., electron beam evaporation technique (EBE) at different substrate temperatures. The effects of substrate temperature on structural, surface morphological and optical properties of the films are studied. (C) 2004 Elsevier B.V. All rights reserved.
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收藏
页码：439 / 445
页数：7
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