Core-level spectra and binding energies of transition metal nitrides by non-destructive x-ray photoelectron spectroscopy through capping layers

被引:143
作者
Greczynski, G. [1 ]
Primetzhofer, D. [2 ]
Lu, J. [1 ]
Hultman, L. [1 ]
机构
[1] Linkoping Univ, Dept Phys IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden
[2] Uppsala Univ, Dept Phys & Astron, Angstrom Lab, POB 516, SE-75120 Uppsala, Sweden
关键词
TiN; XPS; Magnetron sputtering; Binding energy; VN; CrN; NbN; ZrN; MoN; HfN; TaN; WN; AlN; SiN; TITANIUM NITRIDE; THIN-FILMS; ELECTRONIC-STRUCTURE; TANTALUM NITRIDE; NITROGEN IMPLANTATION; INTERFACIAL REACTIONS; ADVENTITIOUS CARBON; VANADIUM NITRIDE; AR+ BOMBARDMENT; XPS;
D O I
10.1016/j.apsusc.2016.10.152
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We present the first measurements of x-ray photoelectron spectroscopy (XPS) core level binding energies (BE: s) for the widely-applicable group IVb-VIb polycrystalline transition metal nitrides (TMN's) TiN, VN, CrN, ZrN, NbN, MoN, HfN, TaN, and WN as well as AlN and SiN, which are common components in the TMN-based alloy systems. Nitride thin film samples were grown at 400.degrees C by reactive dc magnetron sputtering from elemental targets in Ar/ N-2 atmosphere. For XPS measurements, layers are either (i) Ar+ ion-etched to remove surface oxides resulting from the air exposure during sample transfer from the growth chamber into the XPS system, or (ii) in situ capped with a few nm thick Cr or W overlayers in the deposition system prior to air-exposure and loading into the XPS instrument. Film elemental composition and phase content is thoroughly characterized with time-of-flight elastic recoil detection analysis (ToF(-) ERDA), Rutherford backscattering spectrometry (RBS), and x-ray diffraction. High energy resolution core level XPS spectra acquired with monochromatic Al K alpha radiation on the ISO-calibrated instrument reveal that even mild etching conditions result in the formation of a nitrogen-deficient surface layer that substantially affects the extracted binding energy values. These spectra-modifying effects of Ar+ ion bombardment increase with increasing the metal atom mass due to an increasing nitrogen-to-metal sputter yield ratio. The superior quality of the XPS spectra obtained in a non-destructive way from capped TMN films is evident from that numerous metal peaks, including Ti 2p, V 2p, Zr 3d, and Hf 4f, exhibit pronounced satellite features, in agreement with previously published spectra from layers grown and analyzed in situ. In addition, the N/ metal concentration ratios are found to be 25-90% higher than those obtained from the corresponding ion-etched surfaces, and in most cases agree very well with the RBS and ToF-E ERDA values. The N 1 s BE: s extracted from capped TMN films, thus characteristic of a native surface, show a systematic trend, which contrasts with the large BE spread of literature "reference" values. Hence, non-destructive core level XPS employing capping layers provides an opportunity to obtain high-quality spectra, characteristic of virgin in situ grown and analyzed TMN films, although with larger versatility, and allows for extracting core level BE values that are more reliable than those obtained from sputter-cleaned N-deficient surfaces. Results presented here, recorded from a consistent set of binary TMN's grown under the same conditions and analyzed in the same instrument, provide a useful reference for future XPS studies of multinary materials systems allowing for true deconvolution of complex core level spectra. (C) 2016 Elsevier B. V. All rights reserved.
引用
收藏
页码:347 / 358
页数:12
相关论文
共 66 条
[1]  
[Anonymous], 1998, THE JCPDS DATABASE
[2]  
[Anonymous], SERIES STOPPING RANG
[3]  
[Anonymous], 1967, ESCA: atomic, molecular and solid state structure studies by means of electron spectroscopy
[4]   Screening effects in the Ti 2p core level spectra of Ti-based ternary nitrides [J].
Arranz, A. ;
Palacio, C. .
SURFACE SCIENCE, 2006, 600 (12) :2510-2517
[5]   Composition of tantalum nitride thin films grown by low-energy nitrogen implantation:: a factor analysis study of the Ta 4f XPS core level [J].
Arranz, A ;
Palacio, C .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2005, 81 (07) :1405-1410
[6]   Synthesis of hafnium nitride films by 0.5-5 keV nitrogen implantation of metallic Hf: an X-ray photoelectron spectroscopy and factor analysis study [J].
Arranz, A .
SURFACE SCIENCE, 2004, 563 (1-3) :1-12
[7]   NATURE OF THE USE OF ADVENTITIOUS CARBON AS A BINDING-ENERGY STANDARD [J].
BARR, TL ;
SEAL, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03) :1239-1246
[8]   Characterization of nitride coatings by XPS [J].
Bertóti, I .
SURFACE & COATINGS TECHNOLOGY, 2002, 151 :194-203
[9]   A CORRELATION OF AUGER-ELECTRON SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY, AND RUTHERFORD BACKSCATTERING SPECTROMETRY MEASUREMENTS ON SPUTTER-DEPOSITED TITANIUM NITRIDE THIN-FILMS [J].
BURROW, BJ ;
MORGAN, AE ;
ELLWANGER, RC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2463-2469
[10]   BASIC ASSUMPTIONS AND RECENT DEVELOPMENTS IN QUANTITATIVE XPS [J].
CARLSON, TA .
SURFACE AND INTERFACE ANALYSIS, 1982, 4 (04) :125-134