Design of cold-cathode ion sources for precise electron-beam processing of the semiconductor structures

被引：0

作者：

Kozov, A. N. ^{[1
]}

Zaitsev, A. I. ^{[1
]}

Danilovskiy, A. E. ^{[1
]}

Filachev, A. M. ^{[1
]}

机构：

[1] RD&P Ctr ORION, Moscow, Russia

来源：

SEVENTH SEMINAR ON PROBLEMS OF THEORETICAL AND APPLIED ELECTRON AND ION OPTICS | 2006年 / 6278卷

关键词：

ion sources; cold cathode; ion-beam etching; substrate contamination;

D O I：

10.1117/12.693191

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The grounds to choose the construction of the cold-cathode ion-sources for microphotoelectronic production are presented.

引用

页数：4