Electron capture and excitation collisions of Si2+ ions with He atoms at intermediate energies

被引:6
|
作者
Suzuki, S [1 ]
Shimakura, N
Gu, JP
Hirsch, G
Buenker, RJ
Kimura, M
Stancil, PC
机构
[1] Niigata Univ, Fac Sci, Niigata 95021, Japan
[2] Berg Univ Wuppertal, D-42097 Wuppertal, Germany
[3] Yamaguchi Univ, Sch Med, Ube, Yamaguchi 755, Japan
[4] Oak Ridge Natl Lab, Div Phys, Oak Ridge, TN 37831 USA
来源
PHYSICAL REVIEW A | 1999年 / 60卷 / 06期
关键词
D O I
10.1103/PhysRevA.60.4504
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We have investigated electron capture and excitation in collisions of Si2+ ions with He atoms in the collision energy range from 0.02-6 keV/u based on a molecular representation. Molecular states are determined by using the multireference single- and double-excitation configuration-interaction method. We have considered electron capture and excitation both by the ground singlet and metastable triplet Si2+ ions. The capture cross section by the ground singlet Si2+ ion increases with increasing collision energy and reaches a value of similar to 1.5 x 10(-16) cm(2), while that by the metastable triplet ion is found to be large with a magnitude of 4 x 10(-16) cm(2) at the highest energy studied. Weak but conspicuous oscillatory structures are found for both cases, which are due to multichannel interference. The present rate coefficient for the ground singlet Si2+ ion impact is found to be much smaller than those of the [Si4+ + He] system studied earlier. [S1050-2947(99)01311-6].
引用
收藏
页码:4504 / 4509
页数:6
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