Molecular simulation of chemical processes at oxide-water interfaces.

被引：0
|
作者：
Rustad, J [1 ]
机构：
[1] Pacific NW Natl Lab, EMSL, Richland, WA 99352 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2002年 / 223卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
225-PHYS
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页码：C53 / C53
页数：1
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