Exploring the role of -NH2 functional groups of ethylenediamine in chemical mechanical polishing of GCr15 bearing steel

被引:21
作者
Wu, Hanqiang [1 ]
Jiang, Liang [1 ]
Zhong, Xia [1 ]
Liu, Jinwei [1 ]
Qin, Na [2 ]
Qian, Linmao [1 ]
机构
[1] Southwest Jiaotong Univ, Tribol Res Inst, State Key Lab Tract Power, Chengdu 610031, Peoples R China
[2] Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R China
基金
中国国家自然科学基金; 国家重点研发计划;
关键词
chemical mechanical polishing (CMP); complexing agent; bearing steel; X-RAY PHOTOELECTRON; COMPLEXING AGENTS; ALUMINUM NANOPARTICLES; PASSIVATION KINETICS; MILD-STEEL; CORROSION; IRON; CMP; SUBSTRATE; REMOVAL;
D O I
10.1007/s40544-020-0460-6
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
Ethylenediamine with two -NH2 functional groups was used as a critical complexing agent in chemical mechanical polishing (CMP) slurries for a high carbon chromium GCr15 bearing steel (equivalent to AISI 52100). The polishing performance and corresponding mechanism of -NH2 functional groups were thoroughly investigated as a function of pH. It is revealed that, when polished with ethylenediamine and H2O2-based slurries, the material removal rate (MRR) and surface roughness R-a of GCr15 steel gradually decrease as pH increases. Compared with acidic pH of 4.0, at alkaline pH of 10.0, the surface film of GCr15 steel has much higher corrosion resistance and wear resistance, and thus the material removal caused by the pure corrosion and corrosion-enhanced wear are greatly inhibited, resulting in much lower MRR and R-a. Moreover, it is confirmed that a more protective composite film, consisting of more Fe3+ hydroxides/oxyhydroxides and complex compounds with -NH2 functional groups of ethylenediamine, can be formed at pH of 10.0. Additionally, the polishing performance of pure iron and a medium carbon 45 steel exhibits a similar trend as GCr15 steel. The findings suggest that acidic pH could be feasible for amine groups-based complexing agents to achieve efficient CMP of iron-based metals.
引用
收藏
页码:1673 / 1687
页数:15
相关论文
共 54 条
  • [1] X-RAY PHOTOELECTRON-SPECTROSCOPY OF IRON-OXYGEN SYSTEMS
    ALLEN, GC
    CURTIS, MT
    HOOPER, AJ
    TUCKER, PM
    [J]. JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS, 1974, (14): : 1525 - 1530
  • [2] CONTACT AND RUBBING OF FLAT SURFACES
    ARCHARD, JF
    [J]. JOURNAL OF APPLIED PHYSICS, 1953, 24 (08) : 981 - 988
  • [3] Effect of some pyrimidinic Shciff bases on the corrosion of mild steel in hydrochloric acid solution
    Ashassi-Sorkhabi, H
    Shaabani, B
    Seifzadeh, D
    [J]. ELECTROCHIMICA ACTA, 2005, 50 (16-17) : 3446 - 3452
  • [4] EN, EIS and polarization studies to evaluate the inhibition effect of 3H-phenothiazin-3-one, 7-dimethylamin on mild steel corrosion in 1 M HCl solution
    Ashassi-Sorkhabi, H.
    Seifzadeh, D.
    Hosseini, M. G.
    [J]. CORROSION SCIENCE, 2008, 50 (12) : 3363 - 3370
  • [5] Scratch-wear resistance of nanoscale super thin carbon nitride overcoat evaluated by AFM with a diamond tip
    Bai, MW
    Kato, K
    Umehara, N
    Miyake, Y
    Xu, JG
    Tokisue, H
    [J]. SURFACE & COATINGS TECHNOLOGY, 2000, 126 (2-3) : 181 - 194
  • [6] Steels for bearings
    Bhadeshia, H. K. D. H.
    [J]. PROGRESS IN MATERIALS SCIENCE, 2012, 57 (02) : 268 - 435
  • [7] X-RAY PHOTOELECTRON AND INFRARED SPECTROSCOPIC INVESTIGATION OF SPHALERITE ACTIVATION WITH IRON
    BRIENNE, SHR
    ZHANG, QS
    BUTLER, IS
    XU, ZH
    FINCH, JA
    [J]. LANGMUIR, 1994, 10 (10) : 3582 - 3586
  • [8] Study on Float Polishing of Metal Nanometer Surface
    Chi, Xian
    Suo, Xiaohong
    [J]. MATERIALS PROCESSING TECHNOLOGIES, PTS 1 AND 2, 2011, 154-155 : 1757 - +
  • [9] Effects of Microstructure on Corrosion of X70 Pipe Steel in an Alkaline Soil
    Du, C. W.
    Li, X. G.
    Liang, P.
    Liu, Z. Y.
    Jia, G. F.
    Cheng, Y. F.
    [J]. JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE, 2009, 18 (02) : 216 - 220
  • [10] Role of amine and carboxyl functional groups of complexing agents in slurries for chemical mechanical polishing of copper
    Gorantla, VRK
    Goia, D
    Matijevic, E
    Babu, SV
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (12) : G912 - G916