Engineering of two-photon spatial quantum correlations behind a double slit

被引:49
作者
Peeters, W. H. [1 ]
Renema, J. J. [1 ]
van Exter, M. P. [1 ]
机构
[1] Leiden Univ, Leiden Inst Phys, NL-2300 RA Leiden, Netherlands
来源
PHYSICAL REVIEW A | 2009年 / 79卷 / 04期
关键词
optical correlation; optical images; optical phase matching; phase measurement; quantum entanglement; quantum optics; two-photon processes; INTERFERENCE; ENTANGLEMENT; COMPLEMENTARITY; PHOTON;
D O I
10.1103/PhysRevA.79.043817
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
This paper demonstrates the engineering of spatially entangled two-photon states behind a double slit by tailoring the incident pure two-photon state. We experimentally characterize many different two-photon states by measuring their complete two-photon interference patterns in the far field of the double slit. Spatial entanglement right behind the double slit can reside in either the modulus or the phase of the two-photon field. The balance between these two types of entanglement is fully controlled by experimentally utilizing the phase-front curvatures of the pump beam and the phase-matching profile. We project either a far-field image or a magnified near-field image of the two-photon source onto the double slit. Our theoretical analysis shows how the two-photon interference pattern behind the double slit effectively acts as a phase-sensitive probe of the incident two-photon field profile. We thus present phase-sensitive measurements of the generated two-photon field profile probed in an image plane of the two-photon source.
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页数:15
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