Electrical properties of Bi4-xLaxTi3O12 ferroelectric thin films prepared by metalorganic decomposition method

被引:21
|
作者
Yang, WS [1 ]
Kim, NK [1 ]
Yeom, SJ [1 ]
Kweon, SY [1 ]
Roh, JS [1 ]
机构
[1] Hynix Semicond Inc, Memory R&D Div, Ichon Si 476701, Kyoungki Do, South Korea
关键词
ferroelectric film; (Bi; La)(4)Ti3O12; (BLT); metallorganic decomposition (MOD); thickness; composition; crystallization annealing; coercive voltage; switching polarization; leakage current; fatigue;
D O I
10.1143/JJAP.41.727
中图分类号
O59 [应用物理学];
学科分类号
摘要
Bi4-xLaxTi3O12 (BLT) ferroelectric thin films were prepared on a Pt/TiOx/SiO2/Si substrate using metalorganic decomposition (MOD) method, and their electrical properties were evaluated with thickness, composition and crystallization annealing temperature. Irrespective of the preparation conditions, BLT films were c-axis oriented. and had a dense surface morphology without pore to produce smooth Pt/BLT/Pt interfaces of capacitor, The film thickness was controlled as 90 nm to obtain a low coercive voltage (2V(c)) without the problem of capacitor short-fail. The proper composition of Bi3.35La0.85Ti3O12 was selected for the largest switching polarization (P* - P-boolean AND), good fatigue endurance and a low leakage current density (J(L)). After crystallization annealing at 700degreesC, the optimized film of 90 nm Bi3.35La0.85Ti3O12 showed the good electrical properties. such as 2V(c) of 2.0 V P* - P-boolean AND of 13 muC/cm(2), J(L) of 1 X 10(-6) A/cm(2) at a applied voltage of 3 V and no polarization loss up to I x 10(11) fatigue cycles, for ferroelectric random access memory (FeRAM) application.
引用
收藏
页码:727 / 730
页数:4
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