Investigation in the interface roughness of DC-sputtered Mo/B4C multilayer mirrors with variable layer pairs for 7-nm soft X-ray polarizers

被引：4

作者：

Wang, Haixia ^{[1
]}

Xu, Dechao ^{[1
]}

Zhu, Jie ^{[1
]}

Zhang, Zhong ^{[1
]}

Alnaimi, Radhwan ^{[2
]}

Mu, Baozhong ^{[1
]}

Wang, Zhanshan ^{[1
]}

Chen, Hong ^{[1
]}

机构：

[1] Tongji Univ, Dept Phys, IPOE, MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China

[2] Kings Coll London, Dept Phys, London WC2R 2LS, England

来源：

OPTIK | 2014年 / 125卷 / 14期

关键词：

Multilayer; Roughness; Reflectivity; Scattering; FREE-ELECTRON LASER; 6.7 NM WAVELENGTH; MO-SI; STABILITY; LA/B4C; STRESS; BORON; REFLECTIVITY; LITHOGRAPHY; REFLECTANCE;

D O I：

10.1016/j.ijleo.2014.01.044

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The surface and interface roughness of Mo/B4C multilayer mirrors for 7-nm soft X-ray polarizer with variable layer pairs (N=50, 70, 90 and 110), fabricated by DC sputtering technique is investigated by atomic force microscopy and X-ray scattering and reflecting. The experimental results present that the surface and interface roughness of Mo/B4C multilayer mirrors increase layer by layer from its substrate as its Mo layer thickness greater than 2nm, and the roughness grown tendency could be characterized by a quadratic function, (C) 2014 Elsevier GmbH. All rights reserved.

引用

页码：3415 / 3418

页数：4

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