Nanometer scale elemental analysis in the helium ion microscope using time of flight spectrometry

被引:38
作者
Klingner, N. [1 ,2 ]
Heller, R. [1 ]
Hlawacek, G. [1 ]
von Borany, J. [1 ]
Notte, J. [3 ]
Huang, J. [3 ]
Facsko, S. [1 ]
机构
[1] Helmholtz Zentrum Dresden Rossendorf, Bautzner Landstr 400, D-01328 Dresden, Germany
[2] Tech Univ Dresden, D-01062 Dresden, Germany
[3] Carl Zeiss Microscopy LLC, Ion Microscopy Innovat Ctr, 1 Corp Way, Peabody, MA 01960 USA
关键词
Helium ion microscope; Time of flight; Elemental analysis; Backscattering spectrometry; Neutral impact-collision ion scattering spectrometry; Secondary ion mass spectrometry; HIGH-RESOLUTION; TOF-RBS; ENERGY; BACKSCATTERING; SIMULATION; PROBE;
D O I
10.1016/j.ultramic.2015.12.005
中图分类号
TH742 [显微镜];
学科分类号
摘要
Time of flight backscattering spectrometry (ToF-BS) was successfully implemented in a helium ion microscope (HIM). Its integration introduces the ability to perform laterally resolved elemental analysis as well as elemental depth profiling on the nm scale. A lateral resolution of <= 54 nm and a time resolution of Delta t <= 17 ns(Delta t/t <= 5.4%) are achieved. By using the energy of the backscattered particles for contrast generation, we introduce a new imaging method to the HIM allowing direct elemental mapping as well as local spectrometry. In addition laterally resolved time of flight secondary ion mass spectrometry (ToFSIMS) can be performed with the same setup. Time of flight is implemented by pulsing the primary ion beam. This is achieved in a cost effective and minimal invasive way that does not influence the high resolution capabilities of the microscope when operating in standard secondary electron (SE) imaging mode. This technique can thus be easily adapted to existing devices. The particular implementation of ToF-BS and ToF-SIMS techniques are described, results are presented and advantages, difficulties and limitations of this new techniques are discussed. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:91 / 97
页数:7
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