Optical modification and metal complexation of ultrathin spin-coated polymer films

被引:0
作者
Trogisch, S [1 ]
Loppacher, C
Braun, F
Grafström, S
Voit, B
Eng, LM
机构
[1] Tech Univ Dresden, Inst Appl Photophys, Dresden, Germany
[2] Inst Polymer Res Dresden eV, Dresden, Germany
关键词
D O I
10.1002/1521-3900(200208)184:1<261::AID-MASY261>3.0.CO;2-T
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
We report the successful metal salt complexation of ultrathin terpolymer films spin-coated onto glass and silicon substrates and the subsequent reduction of the salt to metal clusters. The photolabile polymer consists of a diazosulfonate side chain polymer which may be decomposed under UV irradiation. Initial, complexed and reduced stages are characterized using optical transmission spectroscopy and X-ray photoelectron spectroscopy, while the film surface roughness, morphology and thickness are determined from atomic force microscopy and ellipsometry. On the one hand, our experiments show that nonirradiated diazosulfonate side groups complex with silver acetate provided from solution, and that silver ions chemically reduce when exposed to a sodium borohydride solution. On the other hand, the complete destruction of the photolabile diazosulfonate unit with UV irradiation was proven. Our experimental investigations are the first successful effort for selective metallization of deposited ultrathin diazosulfonate polymer films. Furthermore, we were able to show that the films can be optically structured by writing micrometer-sized patterns with a focused UV laser beam.
引用
收藏
页码:261 / 274
页数:14
相关论文
共 43 条
[11]  
HANTSCH A, 1897, BER DTSCH CHEM GESEL, V30, P78
[12]   Thin diblock copolymer films on chemically heterogeneous surfaces [J].
Heier, J ;
Kramer, EJ ;
Walheim, S ;
Krausch, G .
MACROMOLECULES, 1997, 30 (21) :6610-6614
[13]   PHYSICOCHEMICAL PROPERTIES OF SMALL METAL PARTICLES IN SOLUTION - MICROELECTRODE REACTIONS, CHEMISORPTION, COMPOSITE METAL PARTICLES, AND THE ATOM-TO-METAL TRANSITION [J].
HENGLEIN, A .
JOURNAL OF PHYSICAL CHEMISTRY, 1993, 97 (21) :5457-5471
[14]   Near-field scanning optical nanolithography using amorphous silicon photoresists [J].
Herndon, MK ;
Collins, RT ;
Hollingsworth, RE ;
Larson, PR ;
Johnson, MB .
APPLIED PHYSICS LETTERS, 1999, 74 (01) :141-143
[15]  
Kolb DM, 2001, ANGEW CHEM INT EDIT, V40, P1162, DOI 10.1002/1521-3773(20010401)40:7<1162::AID-ANIE1162>3.3.CO
[16]  
2-6
[17]  
KRAUSCH G, 1995, MAT SCI ENG R, V14, P1
[18]   Optical near-field lithography on hydrogen-passivated silicon surfaces [J].
Madsen, S ;
Mullenborn, M ;
Birkelund, K ;
Grey, F .
APPLIED PHYSICS LETTERS, 1996, 69 (04) :544-546
[19]   Water soluble and photoactive copolymers containing amidic aryldiazosulfonate groups [J].
Matusche, P ;
Nuyken, O ;
Voit, B ;
VanDamme, M .
JOURNAL OF MACROMOLECULAR SCIENCE-PURE AND APPLIED CHEMISTRY, 1997, A34 (01) :201-209
[20]   Chemically functionalized surfaces from ultrathin block-copolymer films [J].
Meiners, JC ;
Elbs, H ;
Ritzi, A ;
Mlynek, J ;
Krausch, G .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (04) :2224-2227