Temperature-dependent microtensile testing of thin film materials for application to microelectromechanical system

被引：18

作者：

Lin, Ming-Tzer ^{[1
]}

El-Deiry, Paul

Chromik, Richard R.

Barbosa, Nicholas

Brown, Walter L.

Delph, Terry J.

Vinci, Richard P.

机构：

[1] Natl Chung Hsing Univ, Inst Precis Engn, Taichung 402, Taiwan

[2] Natl Chung Hsing Univ, Ctr Nanosci & Nanotechnol, Taichung 402, Taiwan

[3] Lehigh Univ, Mat Sci & Mech Engn Dept, Bethlehem, PA 18015 USA

来源：

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2006年 / 12卷 / 10-11期

关键词：

D O I：

10.1007/s00542-006-0129-8

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A specially designed microtensile apparatus capable of carrying out a series of tests on microscale thin films for microelectromechanical system (MEMS) applications at room temperature and at temperature up to 400 degrees C has been developed and tested, and is described here. Several MEMS-applicable thin films were measured with it, including thermally grown silicon dioxide, gold, and gold-vanadium. The silicon dioxide was tested at room temperature. Gold and gold-vanadium films were tested at room temperature and at 200 and 400 degrees C. Examples of these results are presented.

引用

页码：1045 / 1051

页数：7

共 13 条

[1] Nanoshells: gifts in a gold wrapper [J].