Interface thermal conductance and the thermal conductivity of multilayer thin films

被引:87
|
作者
Cahill, DG
Bullen, A
Lee, SM
机构
[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
[2] Univ Illinois, Coordinated Sci Lab, Urbana, IL 61801 USA
关键词
D O I
10.1068/htwi9
中图分类号
O414.1 [热力学];
学科分类号
摘要
Accurate and simple measurements of the thermal conductivity of thin films deposited on high thermal conductivity substrates have been recently enabled by the development of an Ac hot-wire method, the 3 omega method. Recent progress in the measurement and understanding of heat transport in ultra-thin films (much less than 1 mu m thick) and multilayers is reviewed, and the possibility of using solid-solid interfaces on nanometer length scales to control heat transport in thin film materials is explored. The finite thermal conductance of solid-solid interfaces becomes important when considering heat transport in single layer films <100 nm thick. Through the use of multilayer films-for example, epitaxial superlattices of crystalline semiconductors or nanometer-thick layers of amorphous and microcrystalline oxides-we can study materials with an extremely high and controllable density of internal interfaces, and evaluate the effect of these interfaces on heat transport. For the case of Si-Ge superlattices, the relatively large mismatch of the vibrational properties of silicon and germanium creates a larger reduction in thermal conductivity than for GaAs-A1As superlattices. Surprisingly, heat conduction in multilayers of disordered oxides is essentially unchanged by a high interface density.
引用
收藏
页码:135 / 142
页数:8
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