Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks

被引：13

作者：

Lindner, J. K. N. ^{[1
]}

Seider, C. ^{[1
]}

Fischer, F. ^{[1
]}

Weinl, M. ^{[1
]}

Stritzker, B. ^{[1
]}

机构：

[1] Univ Augsburg, Inst Phys, D-86135 Augsburg, Germany

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2009年 / 267卷 / 8-9期

关键词：

Nano-patterning; He implantation; Swelling; Silicon; Nanosphere lithography;

D O I：

10.1016/j.nimb.2009.01.052

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Nanopatterning of silicon surfaces by means of He(+) ion implantation through self-organized colloidal masks is reported for the first time. Nanosphere lithography (NSL) masks with mask openings of 46-230 nm width were deposited on Si(100) wafers. He(+) ions were implanted through these masks in order to induce a local cavity formation and Si surface swelling. The surface morphology and the subsurface structure were studied using atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM), respectively, as a function of mask and implantation parameters. It is demonstrated that regular arrays of both individual hillocks and trough-like circular rings can be generated. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：1394 / 1397

页数：4

共 6 条

[1]

BURMEISTER F, 1999, APPL SURF SCI, V461, P144

[2] Hydrogen and helium bubbles in silicon [J].

Cerofolini, GF ;

Corni, F ;

Frabboni, S ;

Nobili, C ;

Ottaviani, G ;

Tonini, R .

MATERIALS SCIENCE & ENGINEERING R-REPORTS, 2000, 27 (1-2) :1-52

[3] Cavities in helium implanted and annealed silicon characterized by spectroscopic ellipsometry [J].

Fukarek, W ;

Kaschny, JR .

JOURNAL OF APPLIED PHYSICS, 1999, 86 (08) :4160-4165

[4] Ion beam induced sintering of colloidal polystyrene nano-masks [J].

Kraus, D. ;

Lindner, J. K. N. ;

Stritzker, B. .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2007, 257 (1-2 SPEC. ISS.) :455-458

[5] Shape modifications of self-organised colloidal silica nanomasks on silicon [J].

Lindner, JKN ;

Gehl, B ;

Stritzker, B .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 242 (1-2) :167-169

[6] He-vacancy interactions in Si and their influence on bubble formation and evolution [J].

Raineri, V ;

Coffa, S ;

Szilágyi, E ;

Gyulai, J ;

Rimini, E .

PHYSICAL REVIEW B, 2000, 61 (02) :937-945

← 1 →