Thermal microscopy of electronic materials

被引:28
作者
Heiderhoff, Ralf [1 ]
Makris, Andreas [1 ]
Riedl, Thomas [1 ]
机构
[1] Univ Wuppertal, Chair Elect Devices, Rainer Gruenter Str 21, D-42119 Wuppertal, Nrw, Germany
关键词
Thermal microscopy; Failure analysis; Reliability investigations; Fault localization; Heat transport; Thermal conductivity; Heat capacitance; Thermos-elastic; Phase transition; Melting; Glass transition; Thermally induced strain; Thermally induced stress; Thermoelectric; Thermography; Thermometry; Calorimetry; SThM; SJEM; Laser beam techniques; SCANNING PROBE MICROSCOPY; THIN-FILMS; CONDUCTIVITY MEASUREMENTS; FAILURE ANALYSIS; RESOLUTION; SURFACE; MANAGEMENT; POLYMERS; ELECTROMIGRATION; THERMOGRAPHY;
D O I
10.1016/j.mssp.2015.12.014
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Due to an increasing level of device integration and progressive device miniaturization, the thermal management requires comprehensive microscopic investigations of thermal properties as heat dissipation on the micro- and nanoscale. Today heat management is one of the key limiting factors in a wide range of electronic applications, e.g. in automotive and electro-mobility. In this review, an overview on far-field and near-field thermal microscopy techniques using infrared thermography, laser beam techniques, and scanning probe microscopy is given. The common aim of all these approaches is to get access to temperature distributions, heat transport mechanisms, thermos-elastic quantities, as well as thermoelectric properties of electronic materials on microscopic levels. Examples for devices inspections, for integrated circuit analysis, and for thin film technology applications at micro and nanoscale are presented. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:163 / 176
页数:14
相关论文
共 141 条
[1]   A multimechanism model for photon generation by silicon junctions in avalanche breakdown [J].
Akil, N ;
Kerns, SE ;
Kerns, DV ;
Hoffmann, A ;
Charles, JP .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (05) :1022-1028
[2]   Effects of confinement on material behaviour at the nanometre size scale [J].
Alcoutlabi, M ;
McKenna, GB .
JOURNAL OF PHYSICS-CONDENSED MATTER, 2005, 17 (15) :R461-R524
[3]   Quantitative dynamic near-field microscopy of thermal conductivity [J].
Altes, A ;
Heiderhoff, R ;
Balk, LJ .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2004, 37 (06) :952-963
[4]   Scanning near field thermal microscopy on a micromachined thin membrane [J].
Altes, A ;
Mutamba, K ;
Heiderhoff, R ;
Hartnagel, HL ;
Balk, LJ .
SUPERLATTICES AND MICROSTRUCTURES, 2004, 35 (3-6) :465-476
[5]  
[Anonymous], 2011, MICROELECTRONICS FAI
[6]   SUPER-RESOLUTION APERTURE SCANNING MICROSCOPE [J].
ASH, EA ;
NICHOLLS, G .
NATURE, 1972, 237 (5357) :510-&
[7]   Thermal characterization of microsystems by means of high-resolution thermography [J].
Ashauer, M ;
Ende, J ;
Glosch, H ;
Haffner, H ;
Hiltmann, K .
MICROELECTRONICS JOURNAL, 1997, 28 (03) :327-335
[8]   HIGH-RESOLUTION THERMAL MAPPING OF MICROCIRCUITS USING NEMATIC LIQUID-CRYSTALS [J].
ASZODI, G ;
SZABON, J ;
JANOSSY, I ;
SZEKELY, V .
SOLID-STATE ELECTRONICS, 1981, 24 (12) :1127-&
[9]   Thermal analyses by means of scanning probe microscopy [J].
Balk, LJ ;
Cramer, RM ;
Fiege, GBM .
PROCEEDINGS OF THE 1997 6TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS, 1997, :1-6
[10]  
Balk LJ, 1995, INST PHYS CONF SER, V146, P655