Rapid and highly efficient growth of graphene on copper by chemical vapor deposition of ethanol

被引：34

作者：

Lisi, Nicola ^{[1
]}

Buonocore, Francesco ^{[1
]}

Dikonimos, Theodoros ^{[1
]}

Leoni, Enrico ^{[1
]}

Faggio, Giuliana ^{[2
]}

Messina, Giacomo ^{[2
]}

Morandi, Vittorio ^{[3
]}

Ortolani, Luca ^{[3
]}

Capasso, Andrea ^{[1
]}

机构：

[1] ENEA, Mat Technol Unit, Surface Technol Lab, Casaccia Res Ctr, I-00123 Rome, Italy

[2] Univ Mediterranea Reggio Calabria, Dipartimento Ingn Informaz Infrastrutture & Energ, I-89122 Reggio Di Calabria, Italy

[3] CNR IMM Bologna, I-40129 Bologna, Italy

来源：

THIN SOLID FILMS | 2014年 / 571卷

关键词：

Graphene; Chemical vapor deposition; Ethanol; Copper; Rapid growth; Catalyst; Liquid precursor; LARGE-AREA; FILMS; SINGLE; GRAPHITE; DISORDER; HYDROGEN; OXYGEN; SIZE;

D O I：

10.1016/j.tsf.2014.09.040

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The growth of graphene by chemical vapor deposition on metal foils is a promising technique to deliver large-area films with high electron mobility. Nowadays, the chemical vapor deposition of hydrocarbons on copper is the most investigated synthesis method, although many other carbon precursors and metal substrates are used too. Among these, ethanol is a safe and inexpensive precursor that seems to offer favorable synthesis kinetics. We explored the growth of graphene on copper from ethanol, focusing on processes of short duration (up to one min). We investigated the produced films by electron microscopy, Raman and X-ray photoemission spectroscopy. A graphene film with high crystalline quality was found to cover the entire copper catalyst substrate in just 20 s, making ethanol appear as a more efficient carbon feedstock than methane and other commonly used precursors. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：139 / 144

页数：6

共 37 条

[1] THE INTERACTION OF CH4 AT HIGH-TEMPERATURES WITH CLEAN AND OXYGEN PRECOVERED CU(100)
ALSTRUP, I
CHORKENDORFF, I
ULLMANN, S
[J]. SURFACE SCIENCE, 1992, 264 (1-2) : 95 - 102
[2] Role of Kinetic Factors in Chemical Vapor Deposition Synthesis of Uniform Large Area Graphene Using Copper Catalyst
Bhaviripudi, Sreekar
Jia, Xiaoting
Dresselhaus, Mildred S.
Kong, Jing
[J]. NANO LETTERS, 2010, 10 (10) : 4128 - 4133
[3] Biccari F, 2009, THESIS
[4] General equation for the determination of the crystallite size La of nanographite by Raman spectroscopy
Cançado, LG
Takai, K
Enoki, T
Endo, M
Kim, YA
Mizusaki, H
Jorio, A
Coelho, LN
Magalhaes-Paniago, R
Pimenta, MA
[J]. APPLIED PHYSICS LETTERS, 2006, 88 (16)
[5] Cyclododecane as support material for clean and facile transfer of large-area few-layer graphene
Capasso, A.
De Francesco, M.
Leoni, E.
Dikonimos, T.
Buonocore, F.
Lancellotti, L.
Bobeico, E.
Sarto, M. S.
Tamburrano, A.
De Bellis, G.
Lisi, N.
[J]. APPLIED PHYSICS LETTERS, 2014, 105 (11)
[6] Observations of Early Stage Graphene Growth on Copper
Celebi, K.
Cole, M. T.
Teo, K. B. K.
Park, H. G.
[J]. ELECTROCHEMICAL AND SOLID STATE LETTERS, 2012, 15 (01) : K1 - K4
[7] Oxidation Resistance of Graphene-Coated Cu and Cu/Ni Alloy
Chen, Shanshan
Brown, Lola
Levendorf, Mark
Cai, Weiwei
Ju, Sang-Yong
Edgeworth, Jonathan
Li, Xuesong
Magnuson, Carl W.
Velamakanni, Aruna
Piner, Richard D.
Kang, Junyong
Park, Jiwoong
Ruoff, Rodney S.
[J]. ACS NANO, 2011, 5 (02) : 1321 - 1327
[8] No Graphene Etching in Purified Hydrogen
Choubak, Saman
Biron, Maxime
Levesque, Pierre L.
Martel, Richard
Desjardins, Patrick
[J]. JOURNAL OF PHYSICAL CHEMISTRY LETTERS, 2013, 4 (07): : 1100 - 1103
[9] Thermodynamic description of the Cu-O system
Clavaguera-Mora, MT
Touron, JL
Rodríguez-Viejo, J
Clavaguera, N
[J]. JOURNAL OF ALLOYS AND COMPOUNDS, 2004, 377 (1-2) : 8 - 16
[10] Growth of large-sized graphene thin-films by liquid precursor-based chemical vapor deposition under atmospheric pressure
Dong, Xiaochen
Wang, Peng
Fang, Wenjing
Su, Ching-Yuan
Chen, Yu-Hsin
Li, Lain-Jong
Huang, Wei
Chen, Peng
[J]. CARBON, 2011, 49 (11) : 3672 - 3678

← 1 2 3 4 →