Comparison of model and experiment for Ar, Ar/O2 and Ar/O2/Cl2 inductively coupled plasmas

被引:114
作者
Hsu, Cheng-Che [1 ]
Nierode, Mark A. [1 ]
Coburn, John W. [1 ]
Graves, David B. [1 ]
机构
[1] Univ Calif Berkeley, Dept Chem Engn, Berkeley, CA 94720 USA
关键词
D O I
10.1088/0022-3727/39/15/009
中图分类号
O59 [应用物理学];
学科分类号
摘要
Comparisons of fluid model predictions with various measurements in an inductively coupled plasma are reported. The gas chemistries used include pure Ar, mixtures of Ar and O-2 and mixtures of Ar, O-2 and Cl-2 for pressures ranging from 10 to 80 mTorr and plasma densities ranging from similar to 10(10)-10(11) cm(-3). Measurements of electron density, electron energy probability function, positive ion composition and wall flux and neutral radical concentration at the chamber wall are reported and compared with corresponding model predictions. The model treats electrons, ions and neutrals as fluids, under the assumption of quasineutrality. Power into electrons is from inductive coupling from an external coil and capacitive coupling is neglected. The non-isothermal, multicomponent reacting flow equations with jump boundary conditions are used to describe neutrals and are solved iteratively with the plasma and electromagnetic equations until a steady solution is found. Radical and ion composition predictions are shown to be in reasonable agreement for Ar and Ar/O-2 plasmas, but the corresponding predictions in mixtures of Ar, O-2 and Cl-2 are in only partial agreement with measurements, implying that the chemical reaction database for this chemistry requires further work.
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页码:3272 / 3284
页数:13
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