Estimation of background carrier concentration in fully depleted GaN films

被引:12
作者
Chandrasekar, Hareesh [1 ]
Singh, Manikant [1 ]
Raghavan, Srinivasan [1 ]
Bhat, Navakanta [1 ]
机构
[1] Indian Inst Sci, Ctr Nano Sci & Engn, Bangalore 560012, Karnataka, India
关键词
GaN; devices; capacitance; carrier concentration; ALGAN/GAN; SPECTROSCOPY; HEMTS;
D O I
10.1088/0268-1242/30/11/115018
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Buffer leakage is an important parasitic loss mechanism in AlGaN/GaN high electron mobility transistors (HEMTs) and hence various methods are employed to grow semi-insulating buffer layers. Quantification of carrier concentration in such buffers using conventional capacitance based profiling techniques is challenging due to their fully depleted nature even at zero bias voltages. We provide a simple and effective model to extract carrier concentrations in fully depleted GaN films using capacitance-voltage (C-V) measurements. Extensive mercury probe C-V profiling has been performed on GaN films of differing thicknesses and doping levels in order to validate this model. Carrier concentrations as extracted from both the conventional C-V technique for partially depleted films having the same doping concentration, and Hall measurements show excellent agreement with those predicted by the proposed model thus establishing the utility of this technique. This model can be readily extended to estimate background carrier concentrations from the depletion region capacitances of HEMT structures and fully depleted films of any class of semiconductor materials.
引用
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页数:7
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共 21 条
  • [1] [Anonymous], IEEE T ELECT DEVICES
  • [2] Dissipation-factor-based criterion for the validity of carrier-type identification by capacitance-voltage measurements
    Bierwagen, O.
    Nagata, T.
    Ive, T.
    Van de Walle, C. G.
    Speck, J. S.
    [J]. APPLIED PHYSICS LETTERS, 2009, 94 (15)
  • [3] An early in-situ stress signature of the AlN-Si pre-growth interface for successful integration of nitrides with (111) Si
    Chandrasekar, Hareesh
    Mohan, Nagaboopathy
    Bardhan, Abheek
    Bhat, K. N.
    Bhat, Navakanta
    Ravishankar, N.
    Raghavan, Srinivasan
    [J]. APPLIED PHYSICS LETTERS, 2013, 103 (21)
  • [4] AlGaN/GaN high electron mobility transistors grown on 150 mm Si(111) substrates with high uniformity
    Cheng, Kai
    Leys, Maarten
    Degroote, Stefan
    Derluyn, Joff
    Sijmus, Brian
    Favia, Paola
    Richard, Olivier
    Bender, Hugo
    Germain, Marianne
    Borghs, Gustaaf
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (03) : 1553 - 1555
  • [5] Dislocation-related electron capture behaviour of traps in n-type GaN
    Fang, ZQ
    Look, DC
    Polenta, L
    [J]. JOURNAL OF PHYSICS-CONDENSED MATTER, 2002, 14 (48) : 13061 - 13068
  • [6] Ultrathin Body InAlN/GaN HEMTs for High-Temperature (600 °C) Electronics
    Herfurth, Patrick
    Maier, David
    Lugani, Lorenzo
    Carlin, Jean-Francois
    Roesch, Rudolf
    Men, Yakiv
    Grandjean, Nicolas
    Kohn, Erhard
    [J]. IEEE ELECTRON DEVICE LETTERS, 2013, 34 (04) : 496 - 498
  • [7] Determination of the dielectric constant of GaN in the kHz frequency range
    Kane, M. J.
    Uren, M. J.
    Wallis, D. J.
    Wright, P. J.
    Soley, D. E. J.
    Simons, A. J.
    Martin, T.
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2011, 26 (08)
  • [8] Synergistic effect of reactor chemistry and compressive stress on dislocation bending during GaN growth
    Nagaboopathy, Mohan
    Ravishankar, Narayanan
    Raghavan, Srinivasan
    [J]. APPLIED PHYSICS LETTERS, 2013, 103 (04)
  • [9] Neamen D.A., 2003, Semiconductors physics and devices basic principles third edition copyright McGraw Hill Companies
  • [10] Ng KK., 2021, Physics of Semiconductor Devices