Side-track erasure processes in perpendicular recording

被引：9

作者：

Li, Shaoping ^{[1
]}

Zhang, H. ^{[1
]}

Lu, P. ^{[1
]}

Zhu, W. ^{[1
]}

Edelman, H. ^{[1
]}

Rea, Chris ^{[1
]}

Tabat, Ned ^{[1
]}

Mao, S. ^{[1
]}

Brown, D. ^{[1
]}

Montemorra, M. ^{[1
]}

Palmer, D. ^{[1
]}

机构：

[1] Seagate Technol Inc, Bloomington, MN 55435 USA

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2006年 / 42卷 / 12期

关键词：

magnetic force microscope; perpendicular recording; side track erasure; side writing;

D O I：

10.1109/TMAG.2006.883836

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In perpendicular recording, substantial erasure of the stored data patterns can occur during the writing process. Among all those erasure processes, sidetrack erasure (STE) is one of the critical issues in drive head/media integration. Unlike the adjacent track erasure (ATE) process, the locations of the STE affected areas are often many tens of tracks away from the central writing track location. In this work, we report on an experimental investigation and quantification of the general attributes and the origins of the STE processes in various situations. Particularly, we thoroughly characterize some distinctive signatures and behaviors of STE processes by employing both the amplitude- and BER-based STE measurement methods in combination with a novel magnetic force microscope characterization technique.

引用

页码：3874 / 3879

页数：6

共 8 条

[1] Anti-parellel coupled soft under layers for high-density perpendicular recording [J].