Low-K/Cu CMOS-based SoC technology with 115-GHz fT, 100-GHz fmax, noise 80-nm RF CMOS, high-Q MiM capacitor, and spiral Cu inductor

被引:4
|
作者
Guo, Jyh-Chyurn [1 ]
机构
[1] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu, Taiwan
关键词
f(max); f(T); inductor; MiM capacitor; NFmin; RF CMOS; varactor;
D O I
10.1109/TSM.2006.879415
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Logic CMOS-based RF technology is introduced for a 10-Gb transceiver in which active and passive RF devices have been realized in a single chip. RF nMOS of 115-GHz f(T), 100-GHz f(max), and sub-1.0-dB NFmin at 10 GHz have been fabricated by aggressive device scaling and layout optimization. High-Q MiM capacitor and spiral Cu inductors have been successfully implemented in the same chip by 0.13-mu m low-K/Cu back end of integration line technology. Core 1.0 V MOS and/or junction varactors for VCO at 10 GHz are offerings free of extra cost and realized by the elaborated layout.
引用
收藏
页码:331 / 338
页数:8
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