III-Nitride Tunnel Junctions and Their Applications

被引:5
作者
Rajan, S. [1 ]
Takeuchi, T. [2 ]
机构
[1] Ohio State Univ, Columbus, OH 43210 USA
[2] Meijo Univ, Nagoya, Aichi, Japan
来源
III-NITRIDE BASED LIGHT EMITTING DIODES AND APPLICATIONS, 2ND EDITION | 2017年 / 133卷
关键词
LIGHT-EMITTING-DIODES; VAPOR-PHASE EPITAXY; P-TYPE CONDUCTION; GAN; HYDROGEN; CONTACT; LASERS; PHOTOCATHODE; APERTURE; MIRROR;
D O I
10.1007/978-981-10-3755-9_8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Interband tunneling in semiconductors [1, 2] is one of the clearest manifestations of quantum mechanics in electronic devices. In the case of interband tunneling in a heavily doped PN junction, in reverse bias, electrons tunnel from the filled states in the valence band to the empty states in the conduction band. Under forward bias, tunneling current is observed when electrons tunnel from filled states in the conduction band to empty states in the valence band, as shown in Fig. 8.1. As the conduction band on the n-side becomes biased higher in energy than the valence band, states are not available for electrons to tunnel into. As a result, the current decreases, leading to a characteristic negative differential resistance regime.
引用
收藏
页码:209 / 238
页数:30
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