Internal drift effects on the diffusion of Ag in CdTe

被引:4
作者
Wolf, H. [1 ]
Wagner, F.
Wichert, Th.
Grill, R.
Belas, E.
机构
[1] Univ Saarland, D-66041 Saarbrucken, Germany
[2] Charles Univ, Inst Phys, CZ-12116 Prague 2, Czech Republic
[3] CERN, CH-1211 Geneva, Switzerland
关键词
diffusion; drift; deviation from stoichiometry; internal electric field;
D O I
10.1007/s11664-006-0267-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Anomalous diffusion profiles of Ag in single crystalline CdTe were observed using the radiotracer Ag-111. The diffusion anneals were performed at 800 K under Cd or Te vapor and in vacuum with low Ag concentrations. The measured Ag profiles directly reflect the distribution of the self-interstitials and vacancies of the Cd sublattice and are the result of chemical self-diffusion which describes the variation of the deviation from stoichiometry of the binary crystal as a function of depth and time. It turned out that the spread of the Ag dopant essentially is determined by the drift of the charged defects within the electric field caused by the distribution of the extrinsic and intrinsic defects.
引用
收藏
页码:1350 / 1353
页数:4
相关论文
共 8 条
  • [1] Native defects in CdTe
    Berding, MA
    [J]. PHYSICAL REVIEW B, 1999, 60 (12): : 8943 - 8950
  • [2] GOSELE UM, 1991, MAT SCI TECHNOLOGY C, V4, P197
  • [3] Grill R, 2002, PHYS STATUS SOLIDI B, V229, P161, DOI 10.1002/1521-3951(200201)229:1<161::AID-PSSB161>3.0.CO
  • [4] 2-3
  • [5] EXCITED-STATES OF AG AND CU ACCEPTORS IN CDTE
    MOLVA, E
    CHAMONAL, JP
    MILCHBERG, G
    SAMINADAYAR, K
    PAJOT, B
    NEU, G
    [J]. SOLID STATE COMMUNICATIONS, 1982, 44 (03) : 351 - 355
  • [6] OBSERVATION OF A NEW GETTERING MECHANISM IN (HG, CD)TE
    SCHAAKE, HF
    TREGILGAS, JH
    BECK, JD
    KINCH, MA
    [J]. SOLID STATE COMMUNICATIONS, 1984, 50 (02) : 133 - 136
  • [7] Anomalous diffusion profiles of ag in CdTe due to chemical self-diffusion
    Wolf, H
    Wagner, F
    Wichert, T
    [J]. PHYSICAL REVIEW LETTERS, 2005, 94 (12)
  • [8] OBSERVATION OF INVERSE U-SHAPED PROFILES AFTER PLATINUM DIFFUSION IN SILICON
    ZIMMERMANN, H
    RYSSEL, H
    [J]. APPLIED PHYSICS LETTERS, 1991, 59 (10) : 1209 - 1211