Closely packed and aspect-ratio-controlled antireflection subwavelength gratings on GaAs using a lenslike shape transfer

被引：62

作者：

Song, Young Min ^{[1
]}

Bae, Si Young ^{[1
]}

Yu, Jae Su ^{[2
]}

Lee, Yong Tak ^{[1
]}

机构：

[1] Gwangju Inst Sci & Technol, Dept Informat & Commun, Kwangju 500712, South Korea

[2] Kyung Hee Univ, Dept Elect Engn, Yongin 446701, Gyeonggi Do, South Korea

来源：

OPTICS LETTERS | 2009年 / 34卷 / 11期

关键词：

FABRICATION; SILICON; DESIGN;

D O I：

10.1364/OL.34.001702

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report a simple and low-cost fabrication of antireflection subwavelength grating (SWG) structures on GaAs using the lenslike shape transfer by a holographic lithography and a reflowed photoresist mask. The use of an additional thermal reflow process enhances the close packing of two-dimensional SWGs with a conical shape. The aspect ratio of conical SWG was also controlled easily by adjusting the rf power during the dry etch process. The fabricated SWGs exhibited low reflection properties over a wide spectral range, in agreement with the calculated values using by a rigorous coupled-wave analysis simulation. (C) 2009 Optical Society of America

引用

页码：1702 / 1704

页数：3

共 13 条

[1] Tunable reflection minima of nanostructured antireflective surfaces [J].