MANY-BEAM X-RAY DIFFRACTION FROM SILICON AT EXACT BACKSCATTERING.

被引：0
|
作者：
Sutter, J. P. [1 ,2 ]
Alp, E. E. [3 ]
Bortel, G. [3 ]
Hu, M. Y. [3 ]
Lee, P. [3 ]
Sturhahn, W. [3 ]
Toellner, T. S. [3 ]
Colella, R. [4 ]
Sinn, H. [5 ]
机构：
[1] Purdue Univ, W Lafayette, IN 47907 USA
[2] Argonne Natl Lab, Argonne, IL 60439 USA
[3] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA
[4] Purdue Univ, Dept Phys, W Lafayette, IN 47907 USA
[5] Univ Rostock, Fachbereich Phys, D-18051 Rostock, Germany
来源：
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 1999年 / 55卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
P13.14.021
引用
收藏
页码：532 / 532
页数：1
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