Electronic properties of vacancy-oxygen complex in Ge crystals

被引:66
作者
Markevich, VP
Hawkins, ID
Peaker, AR
Litvinov, VV
Murin, LI
Dobaczewski, L
Lindström, JL
机构
[1] Univ Manchester, Ctr Elect Mat, Manchester M60 1QD, Lancs, England
[2] Belarusian State Univ, Fac Phys, Minsk 220050, BELARUS
[3] Inst Solid State & Semicond Phys, Minsk 220072, BELARUS
[4] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
[5] Lund Univ, Dept Phys, S-22100 Lund, Sweden
关键词
D O I
10.1063/1.1504871
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is argued that the vacancy-oxygen (VO) complex (A center) in Ge has three charge states: double negative, single negative, and neutral. Corresponding energy levels are located at E-c-0.21 eV (VO--/-) and E-v+0.27 eV (VO-/0). An absorption line at 716 cm(-1) has been assigned to the asymmetrical stretching vibration mode of the doubly negatively charged VO complex. (C) 2002 American Institute of Physics.
引用
收藏
页码:1821 / 1823
页数:3
相关论文
共 15 条
[1]   LAPLACE TRANSFORM DEEP-LEVEL TRANSIENT SPECTROSCOPIC STUDIES OF DEFECTS IN SEMICONDUCTORS [J].
DOBACZEWSKI, L ;
KACZOR, P ;
HAWKINS, ID ;
PEAKER, AR .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (01) :194-198
[2]   Irradiation-induced defects in Ge studied by transient spectroscopies [J].
Fage-Pedersen, J ;
Larsen, AN ;
Mesli, A .
PHYSICAL REVIEW B, 2000, 62 (15) :10116-10125
[3]   OXYGEN-RELATED DEFECTS IN IRRADIATED GERMANIUM [J].
FUKUOKA, N ;
SAITO, H ;
KAMBE, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (06) :L353-L355
[4]  
GONCHARO.LA, 1972, SOV PHYS SEMICOND+, V6, P369
[5]  
HULL R, 1999, SEMICONDUCT SEMIMET, V56, P1
[6]  
LITVINOV VM, UNPUB
[7]  
LITVINOV VV, 1984, SOV PHYS SEMICOND+, V18, P707
[8]  
LITVINOV VV, 1983, SOV PHYS SEMICOND+, V17, P1033
[9]   Local vibrational modes of the oxygen-vacancy complex in germanium [J].
Litvinov, VV ;
Murin, LI ;
Lindstrom, JL ;
Markevich, VP ;
Petukh, AN .
SEMICONDUCTORS, 2002, 36 (06) :621-624
[10]   STUDY OF IRRADIATION-INDUCED DEFECTS IN GERMANIUM [J].
NAGESH, V ;
FARMER, JW .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (05) :1549-1553