Ambient Constancy of Passivation-Free Ultra-Thin Zinc Tin Oxide Thin Film Transistor

被引:13
作者
Liu, Li-Chih [1 ]
Chen, Jen-Sue [1 ]
Jeng, Jiann-Shing [2 ]
机构
[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 701, Taiwan
[2] Natl Univ Tainan, Dept Mat Sci, Tainan 700, Taiwan
关键词
ELECTRICAL PERFORMANCE; INSTABILITY; THICKNESS; IMPACT; SIO2;
D O I
10.1149/2.0051512ssl
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An ultra-thin (5 nm-thick), unpassivated zinc tin oxide (ZTO) thin-film transistor TFT, fabricated with solution process, exhibits a good field-effect mobility (13 similar to 14 cm(2)/Vs), small subthreshold swing (similar to 0.30 V/dec.) and high on/off current ratio (similar to 10(8)). The field-effect mobility can be further enhanced by increasing the ZTO thickness to 12 nm and 22 nm. Furthermore, I-D-V-G characteristics of the 5 nm-thick ZTO TFT remain unaffected, regardless of working in air (60% relative humidity), vacuum or dry O-2 atmosphere. The dissimilar TFT characteristics are discussed in terms of oxygen deficiency content, as well as the Fermi level position (E-F to E-C) for ZTO of various thicknesses to explain the moisture immunity of the 5 nm-thick solution-processed ZTO TFT. (C) The Author(s) 2015. Published by ECS. All rights reserved.
引用
收藏
页码:Q59 / Q62
页数:4
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