Numerical simulation of plasma confinement in DC magnetron sputtering under different magnetic fields and anode structures

被引：3

作者：

Kageyama, Junichi ^{[1
,2
]}

Yoshimoto, Mamoru ^{[2
]}

Matsuda, Akifumi ^{[2
]}

Akao, Yasuhiko ^{[1
]}

Shidoji, Eiji ^{[1
]}

机构：

[1] Asahi Glass Co Ltd, Yokohama, Kanagawa 2218755, Japan

[2] Tokyo Inst Technol, Interdisciplinaly Grad Sch Sci & Engn, Yokohama, Kanagawa 2268502, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2014年 / 53卷 / 08期

关键词：

COUPLED PLASMA; DISCHARGES; FREQUENCY;

D O I：

10.7567/JJAP.53.088001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The plasma confinement between the electrodes in direct current magnetron sputtering has been investigated by using the two-dimensional hybrid model. We have quantitatively clarified plasma behavior for different magnetic fields and anode structures. The results show that plasma can be confined in the space near the sputtering target by applying a center-dominant magnetic array even in the absence of an anode facing the target (cathode). This knowledge is expected to be useful for film deposition on insulating materials such as glasses. (C) 2014 The Japan Society of Applied Physics

引用

页数：3

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