Ion plating discharges: evidence of cluster formation during metal evaporation

被引:7
作者
Davison, A [1 ]
Wilson, AD [1 ]
Avelar-Batista, JC [1 ]
Leyland, A [1 ]
Matthews, A [1 ]
Fancey, KS [1 ]
机构
[1] Univ Hull, Dept Engn, Res Ctr Surface Engn, Kingston Upon Hull HU6 7RX, N Humberside, England
基金
英国工程与自然科学研究理事会;
关键词
ion plating; metal clusters; mass spectroscopy;
D O I
10.1016/S0040-6090(02)00335-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Previous work has demonstrated the possible presence of metal clusters in ion plating discharges that utilise evaporative sources. In the present study, cathode sheath thickness measurements under ion plating conditions and mass spectroscopy studies (up to 2500 a.m.u.) of gas evaporation have provided further evidence of metal clusters in the vapour phase. The view that these clusters nucleate and grow by vapour cooling, through metal atoms losing energy by collisions with gas atoms, is supported by the following observations: (i) for evaporation at a fixed gas pressure, the abundance of clusters seems to be enhanced if argon is used instead of neon, indicating the greater cooling effect from a gas with larger atomic mass; (ii) cluster detection rate appears to be increased with increasing gas pressure, and this can be attributed to higher collision frequencies leading to enhanced cooling. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:7 / 12
页数:6
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