Low energy plasma focus as an intense X-ray source for radiography

被引：8
作者：
Hussain, S [1 ]
Zakaullah, A
Ali, S
Waheed, A
机构：
[1] Quaid I Azam Univ, Dept Phys, Islamabad 45320, Pakistan
[2] PINSTECH, Islamabad 44000, Pakistan
来源：
PLASMA SCIENCE & TECHNOLOGY | 2004年 / 6卷 / 03期
关键词：
plasma focus; X-ray source; radiography;
D O I：
10.1088/1009-0630/6/3/006
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Study on X-ray emission from a low energy (1.8 kJ) plasma focus device powered by a 9 muF capacitor bank, charged at 20 kV and giving peak discharge current of about 175 kA by using a lead-inserted copper-tapered anode is reported. The X-ray yield in different energy windows is measured as a function of hydrogen filling pressure. The maximum yield in 4pi-geometry is found to be (27.3 +/- 1.1) J and corresponding wall plug efficiency for X-ray generation is 1.52 +/- 0.06%. X-ray emission, presumably due to bombarding activity of electrons in current sheath at the anode tip was dominant, which is confirmed by the pinhole images. The feasibility of the device as an intense X-ray source for radiography is demonstrated.
引用
收藏
页码：2296 / 2300
页数：5
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