Synthesis of high-density arrays of graphene nanoribbons by anisotropic metal-assisted etching

被引:15
作者
Ago, Hiroki [1 ,2 ,3 ]
Kayo, Yasumichi [2 ]
Solis-Fernandez, Pablo [1 ]
Yoshida, Kazuma [2 ]
Tsuji, Masaharu [1 ,2 ]
机构
[1] Kyushu Univ, Inst Mat Chem & Engn, Fukuoka 8168580, Japan
[2] Kyushu Univ, Grad Sch Engn Sci, Fukuoka 8168580, Japan
[3] Japan Sci & Technol Agcy JST, PRESTO, Kawaguchi, Saitama 3320012, Japan
关键词
WALLED CARBON NANOTUBES; SINGLE-LAYER GRAPHENE; ELECTRONIC-PROPERTIES; EPITAXIAL-GROWTH; CATALYTIC GROWTH; ATOMIC-STRUCTURE; PRESSURE; SURFACE; PLANE; EDGES;
D O I
10.1016/j.carbon.2014.07.010
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We demonstrate the synthesis of highly aligned dense arrays of graphene nanoribbons (GNRs) based on metal-assisted etching of chemical vapor deposition-grown single-layer graphene. In order to obtain GNR arrays, controlling the direction of the etching becomes an important task. Crystalline surfaces of r- and a-planes of sapphire (alpha-Al2O3) were found to induce anisotropic etching of the graphene along their specific crystallographic directions. In contrast, anisotropic surface of ST-cut quartz induced few etching lines. We found that the graphene etching is strongly dependent on the metal species; the order of the catalytic activity of metal nanoparticles is Ni > Fe >> Cu. Etching temperature and H-2 concentration also strongly influenced the density and quality of the etching lines. Our anisotropic graphene etching is expected to offer a new route toward the synthesis of high density GNR array in large area without relying on any lithographic techniques for future electronic devices. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:339 / 346
页数:8
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