VF Degradation of 4H-SiC PiN Diodes Using Low-BPD Wafers

被引:10
作者
Ota, C. [1 ]
Nishio, J. [1 ]
Takao, K. [1 ]
Shinohe, T. [1 ]
机构
[1] Toshiba Co Ltd, Corp R&D Ctr, Saiwai Ku, Kawasaki, Kanagawa 2128582, Japan
来源
SILICON CARBIDE AND RELATED MATERIALS 2013, PTS 1 AND 2 | 2014年 / 778-780卷
关键词
PiN diode; V-F degradation; basal plane dislocation; Shockley stacking fault; threading edge dislocation;
D O I
10.4028/www.scientific.net/MSF.778-780.851
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In this paper, we found different origin of forward voltage (V-F) degradation of SiC bipolar devices other than basal plane dislocations (BPDs) propagated from the SiC substrate. V-F degradation of the 4H-SiC PiN diodes with low-BPD wafers was evaluated and its origins were discussed. Some diodes suffered V-F degradation, even though they were fabricated on BPD-free area. Photoluminescence (PL) mapping, Transmission electron microscopy (TEM) image, and optical observation after KOH etching showed that there were Shockley stacking faults (SSFs) and combined etch-pits arrays, which were presumed to be caused by the device process.
引用
收藏
页码:851 / 854
页数:4
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