alumina;
ferromagnetic materials;
II-VI semiconductors;
magnetic epitaxial layers;
molecular beam epitaxial growth;
phonons;
photoluminescence;
plasma materials processing;
reflectivity;
segregation;
semiconductor epitaxial layers;
semimagnetic semiconductors;
spectral line broadening;
wide band gap semiconductors;
zinc compounds;
OPTICAL-PROPERTIES;
ZNO;
SPECTRA;
ENERGY;
LAYERS;
D O I:
10.1063/1.3078034
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
We present a systematic study of temperature-dependent reflectance (R) and photoluminescence (PL) measurements on ZnMnO films grown by plasma-assisted molecular beam epitaxy. For the first time, the three free-exciton transitions FXA (Gamma(7c)-Gamma(u)(7v)), FXB (Gamma(7c)-Gamma(9v)), and FXC (Gamma(7c)-Gamma(l)(7v)) and the longitudinal-optical phonon replicas of FXB and FXC of ZnMnO films have been clearly observed in the R spectra. The parameters describing the activation energy and the temperature dependence of the transition energy and broadening have been extracted by fitting the experimental R and PL spectra. The spectral data of ZnMnO films not only show the deterioration of crystalline quality with increasing Mn composition fraction but also indicate the Mn clustering caused by Mn atom segregation.
机构:
Korea Inst Ind Technol, Natl Ctr Nanoprocess & Equipments, Gwangju R&D Ctr, Nanoelect Team, Gwangju 500480, South KoreaKorea Inst Ind Technol, Natl Ctr Nanoprocess & Equipments, Gwangju R&D Ctr, Nanoelect Team, Gwangju 500480, South Korea
Kim, Young Mi
Park, Il Woo
论文数: 0引用数: 0
h-index: 0
机构:
Seoul Natl Univ Educ, Dept Sci Educ, Seoul 137742, South KoreaKorea Inst Ind Technol, Natl Ctr Nanoprocess & Equipments, Gwangju R&D Ctr, Nanoelect Team, Gwangju 500480, South Korea
Park, Il Woo
JOURNAL OF THE KOREAN MAGNETIC RESONANCE SOCIETY,
2008,
12
(01):
: 26
-
32
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Shen, Yude
Li, Yawei
论文数: 0引用数: 0
h-index: 0
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Li, Yawei
Jiang, Kai
论文数: 0引用数: 0
h-index: 0
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Jiang, Kai
Zhang, Jinzhong
论文数: 0引用数: 0
h-index: 0
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Zhang, Jinzhong
Duan, Zhihua
论文数: 0引用数: 0
h-index: 0
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Duan, Zhihua
Hu, Zhigao
论文数: 0引用数: 0
h-index: 0
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Hu, Zhigao
Chu, Junhao
论文数: 0引用数: 0
h-index: 0
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
机构:
Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
Jung, YS
No, YS
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
No, YS
Kim, JS
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
Kim, JS
Choi, WK
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South KoreaKorea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
机构:
Leibniz Inst Kristallzuchtung IKZ, Max Born Str,2, D-12489 Berlin, GermanyLeibniz Inst Kristallzuchtung IKZ, Max Born Str,2, D-12489 Berlin, Germany
Chou, Ta-Shun
Bin Anooz, Saud
论文数: 0引用数: 0
h-index: 0
机构:
Leibniz Inst Kristallzuchtung IKZ, Max Born Str,2, D-12489 Berlin, GermanyLeibniz Inst Kristallzuchtung IKZ, Max Born Str,2, D-12489 Berlin, Germany
Bin Anooz, Saud
Grueneberg, Raimund
论文数: 0引用数: 0
h-index: 0
机构:
Leibniz Inst Kristallzuchtung IKZ, Max Born Str,2, D-12489 Berlin, GermanyLeibniz Inst Kristallzuchtung IKZ, Max Born Str,2, D-12489 Berlin, Germany
Grueneberg, Raimund
Rehm, Jana
论文数: 0引用数: 0
h-index: 0
机构:
Leibniz Inst Kristallzuchtung IKZ, Max Born Str,2, D-12489 Berlin, GermanyLeibniz Inst Kristallzuchtung IKZ, Max Born Str,2, D-12489 Berlin, Germany