Numerical Simulation of β-Ga2O3 Single Crystal Growth by Czochralski Method with an Insulation Lid

被引:12
作者
Wu, Dan [1 ,2 ]
Xia, Ning [2 ]
Ma, Keke [2 ]
Wang, Jiabin [2 ]
Li, Cheng [1 ,2 ]
Jin, Zhu [1 ,2 ]
Zhang, Hui [1 ,2 ]
Yang, Deren [1 ,2 ]
机构
[1] Zhejiang Univ, Sch Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
[2] ZJU, Zhejiang Prov Key Lab Power Semicond Mat & Devices, Hangzhou Global Sci & Technol Innovat Ctr, Hangzhou 311200, Peoples R China
基金
中国国家自然科学基金;
关键词
beta-Ga2O3; insulation lid; numerical simulation; Czochralski method; melt; crystal interface; GAS-FLOW; OPTIMIZATION; MELT;
D O I
10.3390/cryst12121715
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The effect of an insulation lid on the growth of 4-inch beta-Ga2O3 single crystals by the Czochralski method is analyzed by numerical simulation. The insulation lid mainly hinders upward radiant heat transfer from the melt and crucible and increases the axial temperature gradient in the crystal. Such benefits make the melt/crystal interface convex, which is conducive to suppressing spiral growth and growing large crystals with high quality. Materials with low thermal conductivity lambda and low emissivity epsilon are the optimal choices for making an insulation lid. The inner hole has a great influence on the isolation of radiant heat, and it is determined that the maximum size of the inner diameter Din should not be larger than 130 mm. Thermal stress analysis results indicated that the insulation lid will cause a better stress distribution, illustrating the effect of the insulation lid on the quality of a cylindrical crystal.
引用
收藏
页数:11
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