The effect of embedding N vacancies into g-C3N4 on the photocatalytic H2O2 production ability via H2 plasma treatment

Dielectric barrier discharge plasma was used to prepare N vacancies embedded g-C3N4 catalyst in situ under H-2 atmosphere for the first time. XRD, N-2 adsorption, UV-Vis, SEM, TEM, XPS, EIS, EPR, O-2-TPD, photocurrent and PL were used to characterize the obtained catalysts. The photocatalytic H2O2 production ability of as-prepared catalyst was investigated. The results show that, compared with traditional roasting method, H-2 plasma treatment can embed more N vacancies into g-C3N4 lattice. Nitrogen vacancies are the active centers, which can adsorb reactant oxygen molecules as well as trap photoelectrons and promote the transfer of photoelectrons from the catalyst to adsorbed oxygen molecules for the subsequent reduction reaction. This work provides a new strategy to modify g-C3N4 based catalyst.