Electrophysical properties of double-layer nickel-base and vanadium-base films within the intermediate temperature range

被引：10
作者：
Chornous, A [1 ]
Protsenko, I [1 ]
Shpetnyi, I [1 ]
机构：
[1] Sumy State Univ, UA-40007 Sumy, Ukraine
来源：
CRYSTAL RESEARCH AND TECHNOLOGY | 2004年 / 39卷 / 07期
关键词：
double-layer films; phase composition; temperature coefficient of resistance; grain boundary scattering; resistivity;
D O I：
10.1002/crat.200310231
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
Phase composition of the double-layer Ni-base and V-base films obtained and annealed in vacuum of 10(-4)-10(-5) Pa within the temperature range of 700-900 K is studied by technique of electronography and transmission electron microscopy. Temperature dependence of resistance and temperature coefficient of resistance (TCR) was investigated. Comparison of TCR experimental data with the calculated data was made at T=300 K on basis of semiclassical and macroscopic models and formula for TCR of alloys.
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页码：602 / 610
页数：9
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