共 21 条
Photoluminescence and Raman scattering in axial Si/Ge nanowire heterojunctions
被引:12
作者:

Chang, H. -Y.
论文数: 0 引用数: 0
h-index: 0
机构:
New Jersey Inst Technol, Dept ECE, Newark, NJ 07102 USA New Jersey Inst Technol, Dept ECE, Newark, NJ 07102 USA

Tsybeskov, L.
论文数: 0 引用数: 0
h-index: 0
机构:
New Jersey Inst Technol, Dept ECE, Newark, NJ 07102 USA New Jersey Inst Technol, Dept ECE, Newark, NJ 07102 USA

Sharma, S.
论文数: 0 引用数: 0
h-index: 0
机构:
Hewlett Packard Labs, Informat & Quantum Syst Lab, Palo Alto, CA 94304 USA New Jersey Inst Technol, Dept ECE, Newark, NJ 07102 USA

Kamins, T. I.
论文数: 0 引用数: 0
h-index: 0
机构:
Hewlett Packard Labs, Informat & Quantum Syst Lab, Palo Alto, CA 94304 USA New Jersey Inst Technol, Dept ECE, Newark, NJ 07102 USA

Wu, X.
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada New Jersey Inst Technol, Dept ECE, Newark, NJ 07102 USA

Lockwood, D. J.
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada New Jersey Inst Technol, Dept ECE, Newark, NJ 07102 USA
机构:
[1] New Jersey Inst Technol, Dept ECE, Newark, NJ 07102 USA
[2] Hewlett Packard Labs, Informat & Quantum Syst Lab, Palo Alto, CA 94304 USA
[3] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
基金:
美国国家科学基金会;
关键词:
SI;
HETEROSTRUCTURES;
NANOSTRUCTURES;
SILICON;
GROWTH;
DEVICES;
STRAIN;
GE;
D O I:
10.1063/1.3240595
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
In crystalline, dislocation-free, Si/Ge nanowire axial heterojunctions grown using the vapor-liquid-solid technique, photoluminescence and Raman spectroscopy reveal a SiGe alloy transition layer with preferential chemical composition and strain. In addition to the lattice mismatch, strain in Si/Ge nanowires is observed from a temperature dependent study to be affected by the difference in Si and Ge thermal expansion. The conclusions are supported by analytical transmission electron microscopy measurements. (C) 2009 American Institute of Physics. [doi:10.1063/1.3240595]
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